PVA Nodular Brush after CMP Process Cleanning

PVA Nodular roller description: Our PVA Brush Roller is applied to semiconductor, rigid disk & sapphire wafer industries. Our PVA Sponge Roller are able to remove particles from wafer and disk media efficiently. We design and manufacture PVA products to meet the customer needs of each unique application and accept customization service. Semiconductor wafers need to be cleaned after CMP process, and PVA absorbent sponge has excellent water absorption performance and cleaning effect, which can effectively clean the surface of the wafer, remove surface pollutants and residues, and ensure the quality and stability of the wafer.  Our one time molding process can prevent operator wrong installation. Our brush is very easy to install on the machine and efficient to reduce customer maintenance time Physical characteristics 30% compressive stress 110-120 g/cm2 Apparent Density     0.11-0.13 g/cm3 Tensile Strength     4.7-5.6 kg…